FORNAPLUS UV-770
Bis(2,2,6,6,-tetramethyl-4-piperidyl)sebaceate
PRODUCT SPECIFICATIONS
|
Brand: |
FORNAPLUS® |
|
Model No: |
UV-770 |
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Chemical Name: |
Bis(2,2,6,6,-tetramethyl-4-piperidyl)sebaceate |
Character:
FORNAPLUS® UV-770 is a hindered amine light stabilizer (HALS) for applicattons demanding parttcularly high light stability. It provides excellent light stability for thick secttons but can also be used for artt-cles with a high surface area such as fflms and tapes.
Specifications & Typical Properties
| Item | Typical Value/Properties |
|---|---|
| Molecular Weigh | 481 g/mol |
| Melting Point ℃ | 81-85℃ |
| Product Forms | white crystalline granule |
| Packing Specification | 20kg/bag |
Applications:
• FORNAPLUS® UV-770 is recommended to be used in polypropylene, impact modiffed PP (TPO), EPDM, polystyrene, impact poystyrene, ABS, SAN, ASA and polyurethanes and is also effecttve in polyamides and polyacetals.
• FORNAPLUS® UV-770 is a low molecular weight hindered amine light stabilizer that provides excellent light stability for thick
secttons and fflms in the recommended substrates. Benefft of using FORNAPLUS® UV-770 is the high light-stabilizing performance, parttcularly in PP thick secttons. It has broad compattbility and can be easily dispersed.
Disclaimer: While Fornax has endeavored to ensure the accuracy and reliability of all statements and information contained in this material, it disclaims all warranties or guarantees, express or implied, in this regard. The information provided in this material does not relieve the user of responsibility for tests and trials performed on his own, and the user assumes full risk and responsibility for the use of the information and the results obtained. No statement or recommendation made herein regarding the use of materials and workmanship represents or warrants that such use will not infringe a patent, nor does it constitute a recommendation to infringe any patent. Users should not assume that all toxicity data and safety measures are listed in this material, or that no additional measures are necessary.
Ver: April, 2025 Leverkusen, Germany